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T7100: Difference between revisions
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this form of [[distributed deflection plates]] to achieve the necessary bandwidth), followed by | this form of [[distributed deflection plates]] to achieve the necessary bandwidth), followed by | ||
an electrostatic scan-expansion lens that increases deflection 4.5 times vertically and 4 times | an electrostatic scan-expansion lens that increases deflection 4.5 times vertically and 4 times | ||
horizontally, before it hits the micro-channel plate | horizontally, before it hits the micro-channel plate (MCP). | ||
The MCP consists of parallel channels of 25 μm diameter and offset at a slight angle to the beam. | |||
The inside walls of these channels are coated with resistive material, with a voltage of 700-1050 V applied | The inside walls of these channels are coated with resistive material, with a voltage of 700-1050 V applied | ||
between back and front of the plate. Electrons entering a channel hit the wall where they initiate a cascade | between back and front of the plate. Electrons entering a channel hit the wall where they initiate a cascade | ||