Micro-channel plate CRT: Difference between revisions

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trace, which is needed particularly at high sweep rates.  Typically it sits directly behind the face of the CRT.  It requires its own bias voltage.   
trace, which is needed particularly at high sweep rates.  Typically it sits directly behind the face of the CRT.  It requires its own bias voltage.   


The electron beam passes through the deflection plates before it hits the micro-channel plate, which consists of parallel channels  
The electron beam passes through the deflection plates before it hits the micro-channel plate, which consists of parallel channels offset at a slight angle to the beam.  
offset at a slight angle to the beam. The inside walls of these channels are coated with resistive material, with an acceleration voltage  
The inside walls of these channels are coated with resistive material, with an acceleration voltage  
on the order of 1 kV applied between back and front of the plate. Electrons entering a channel hit the wall where they initiate a cascade  
on the order of 1 kV applied between back and front of the plate.  
of secondary electron emission like in a photomultiplier. At the exit of the channels, a final acceleration voltage propels the beam across  
Electrons entering a channel hit the wall where they initiate a cascade of secondary electron emission like in a photomultiplier. At the exit of the channels, a final acceleration voltage propels the beam across a small gap toward the CRT's phosphor coating.   
a small gap toward the CRT's phosphor coating.  In a typical MCP CRT like the [[T7100]], the channels have 25 μm diameters.
In a typical MCP CRT like the [[T7100]], the channels have 25 μm diameters.


MCP amplification deteriorates in proportion to total charge passed per channel or unit of area, making them
MCP amplification deteriorates in proportion to total charge passed per channel or unit of area, making them particularly prone to a form of burn-in.  
particularly prone to a form of burn-in.  
Careful biasing along with beam current/time limiting mechanisms are necessary to achieve the full life time.
Careful biasing along with beam current/time limiting mechanisms are necessary to achieve the full life time.


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==Links==
==Links==
* [http://en.wikipedia.org/wiki/Micro-channel_plate Wikipedia:Micro-channel Plate]
* [[wikipedia:Microchannel_plate_detector|Micro-channel plate detector]] @ Wikipedia
* [http://w140.com/US5134337.pdf US Patent 5134337]
* [http://w140.com/US4931704.pdf US Patent 4931704]
* [http://w140.com/US4956548.pdf US Patent 4956548]
* [https://www.youtube.com/watch?v=v9KaTgChudw Tektronix 2467B "Bright Eye (tm)" Oscilloscope promotional video]
* [https://www.youtube.com/watch?v=v9KaTgChudw Tektronix 2467B "Bright Eye (tm)" Oscilloscope promotional video]
 
* [[Patent US 5134337A|US Patent 5,134,337]], Projection lens assembly for planar electron source. Kongslie et al., 1992. [http://w140.com/US5134337.pdf PDF]
 
* [[Patent US 4931704A|US Patent 4,931,704]], Ultrafast sampling oscilloscope. Alfano et al., 1990. [http://w140.com/US4931704.pdf PDF]
* [[Patent US 4956548A|US Patent 4,956,548]], Ultrafast oscilloscope. Alfano et al., 1990. [http://w140.com/US4956548.pdf PDF]
* [[Patent US 4365150A|US Patent 4,365,150]], Gain stabilized microchannel plates and MCP treatment method. Roger S. Bateman, 1982.
* [https://apps.dtic.mil/sti/pdfs/ADA195556.pdf AD-A195 556], Development and Manufacture of the Microchannel Plate (MCP)]US Army report, 1988.
[[Category:Micro-channel plate CRTs]]
[[Category:Micro-channel plate CRTs]]
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