T7100: Difference between revisions
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{{CRT | |||
|Manufacturer=Tektronix | |||
|Model=Tektronix T7100 | |||
|Part_nos=154-0783-00 | |||
|Description=Micro-channel CRT | |||
|Used_in=7104; R7103 | |||
|Designers= | |||
}} used in the [[7104]] and [[R7103]] analog 1 GHz scopes. | |||
It features a [[micro-channel plate]] electron beam amplification stage. | It features a [[micro-channel plate]] electron beam amplification stage. | ||
[[File:Micro-channel plate diagram.jpg | thumb | 550px | right | MCP diagram<br />(click image to enlarge)]] | [[File:Micro-channel plate diagram.jpg | thumb | 550px | right | MCP diagram<br />(click image to enlarge)]] | ||
Compared to non-MCP high-speed tubes, the T7100 uses reduced beam current and acceleration voltage | Compared to non-MCP high-speed tubes, the T7100 uses reduced beam current and acceleration voltage to achieve high deflection sensitivity, eliminating the need for high amplifier output voltages, thereby boosting amplifier bandwidth. | ||
to achieve high deflection sensitivity, eliminating the need for high amplifier output voltages, thereby boosting | |||
amplifier bandwidth. | |||
The electron beam passes through terminated helical deflection plates (both X and Y axes use | The electron beam passes through terminated helical deflection plates (both X and Y axes use this form of [[distributed deflection plates]] to achieve the necessary bandwidth), followed by an electrostatic scan-expansion lens that increases deflection 4.5 times vertically and 4 times horizontally, before it hits the micro-channel plate (MCP). | ||
this form of [[distributed deflection plates]] to achieve the necessary bandwidth), followed by | |||
an electrostatic scan-expansion lens that increases deflection 4.5 times vertically and 4 times | |||
horizontally, before it hits the micro-channel plate (MCP). | |||
The deflection structures are described in [https://patents.google.com/patent/US4093891 US Patent 4,093,891]. | The deflection structures are described in [https://patents.google.com/patent/US4093891 US Patent 4,093,891]. | ||
The scan-expansion lens is a "box lens" design, which is discussed on pages 53−55 | The scan-expansion lens is a "box lens" design, which is discussed on pages 53−55 of the ''[[Media:7104_maintenance.pdf|7104 maintenance document]]''. | ||
of the ''[[Media:7104_maintenance.pdf|7104 maintenance document]]''. | |||
The MCP consists of parallel channels of 25 μm diameter and offset at a slight angle to the beam. | The MCP consists of parallel channels of 25 μm diameter and offset at a slight angle to the beam. | ||
The inside walls of these channels are coated with resistive material, with a voltage of 700-1050 V applied | The inside walls of these channels are coated with resistive material, with a voltage of 700-1050 V applied between back and front of the plate. Electrons entering a channel hit the wall where they initiate a cascade of secondary electron emission like in a [https://en.wikipedia.org/wiki/Photomultiplier photomultiplier]. | ||
between back and front of the plate. Electrons entering a channel hit the wall where they initiate a cascade | |||
of secondary electron emission like in a [https://en.wikipedia.org/wiki/Photomultiplier photomultiplier]. | |||
A final 10 kV potential accelerates the beam across a 3 mm gap toward the [[phosphor]] coating. | A final 10 kV potential accelerates the beam across a 3 mm gap toward the [[phosphor]] coating. |