Tadanori Yamaguchi
Tadanori Yamaguchi (? – ?)
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Patents by Tadanori Yamaguchi
Page | Office | Number | Title | Inventors | Company | Filing date | Grant date |
---|---|---|---|---|---|---|---|
Patent US 4217599A | US | 4217599A | Narrow channel MOS devices and method of manufacturing | Shuichi Sato • Tadanori Yamaguchi • Arthur D. Ritchie | Tektronix Inc | 1977-12-21 | 1980-08-12 |
Patent US 4229756A | US | 4229756A | Ultra high speed complementary MOS device | Shuichi Sato • Tadanori Yamaguchi • Jack Sachitano | Tektronix Inc | 1979-02-09 | 1980-10-21 |
Patent US 4228447A | US | 4228447A | Submicron channel length MOS inverter with depletion-mode load transistor | Shuichi Sato • Tadanori Yamaguchi | Tektronix Inc | 1979-02-12 | 1980-10-14 |
Patent US 4261761A | US | 4261761A | Method of manufacturing sub-micron channel width MOS transistor | Shuichi Sato • Tadanori Yamaguchi • Arthur D. Ritchie | Tektronix Inc | 1979-09-04 | 1981-04-14 |
Patent US 4477310A | US | 4477310A | Process for manufacturing MOS integrated circuit with improved method of forming refractory metal silicide areas | Hee K. Park • Tadanori Yamaguchi | Tektronix Inc | 1983-08-12 | 1984-10-16 |
Patent US 4486266A | US | 4486266A | Integrated circuit method | Tadanori Yamaguchi | Tektronix Inc | 1983-08-12 | 1984-12-04 |
Patent US 4902640A | US | 4902640A | High speed double polycide bipolar/CMOS integrated circuit process | Jack Sachitano • Hee K. Park • Paul K. Boyer • Gregory C. Eiden • Tadanori Yamaguchi | Tektronix Inc | 1987-08-19 | 1990-02-20 |
Patent US 4876214A | US | 4876214A | Method for fabricating an isolation region in a semiconductor substrate | Tadanori Yamaguchi • Evan Patton • Eric Lane • Simon Yu | Tektronix Inc | 1988-06-02 | 1989-10-24 |
Patent US 4994400A | US | 4994400A | Method of fabricating a semiconductor device using a tri-layer structure and conductive sidewalls | Tadanori Yamaguchi • Yeou-Chong S. Yu • Carol A. Hacherl • Evan E. Patton | Tektronix Inc | 1989-01-27 | 1991-02-19 |